Summary

DescriptionAltpsm.svg	Deutsch: Intensitätsprofil einer alternierenden Phasenschiebermaske
Date	25 June 2010
Source	http://www.halbleiter.org/lithografie/maskentechnik/
Author	Gauder
Permission (Reusing this file)	This work is free and may be used by anyone for any purpose. If you wish to use this content, you do not need to request permission as long as you follow any licensing requirements mentioned on this page. The Wikimedia Foundation has received an e-mail confirming that the copyright holder has approved publication under the terms mentioned on this page. This correspondence has been reviewed by a Volunteer Response Team (VRT) member and stored in our permission archive. The correspondence is available to trusted volunteers as ticket #2011042210017163. If you have questions about the archived correspondence, please use the VRT noticeboard. Ticket link: https://ticket.wikimedia.org/otrs/index.pl?Action=AgentTicketZoom&TicketNumber=2011042210017163 Find other files from the same ticket: Category:Items with VRTS permission confirmed
Other versions	Datei:Altpsm.png
SVG development InfoField	The SVG code is valid.  This diagram was created with Inkscape, or with something else. Category:Valid SVG created with Inkscape:Diagrams#Altpsm.svgCategory:Created with Inkscape-undef   Category:Translation possible - SVGThis diagram uses embedded text that can be easily translated using a text editor.

Licensing

Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License.http://www.gnu.org/copyleft/fdl.htmlGFDLGNU Free Documentation Licensetruetrue

Original upload log

Transferred from de.wikipedia to Commons by Brackenheim using CommonsHelper.

• 2011-04-23 20:30 Cepheiden 315×240× (20871 bytes) Versuch diverse Elemente für die Darstellung zu korrigieren.
• 2010-06-25 09:12 Gauder 314×239× (24050 bytes) {{Information |Beschreibung = Intensitätsprofil einer alternierenden Phasenschiebermaske |Quelle = http://www.halbleiter.org/lithografie/maskentechnik/ |Urheber = ~~~ |Datum = 25.06.2010 }}