File:OpcedPhotomask.svg
Summary
| Description |
English: A realistic photomask. It is obtained by taking a polygon layout we desire to have on the wafer, adding to it assist features, and applying en:optical proximity correction. |
| Date | |
| Source | Own work |
| Author | LithoGuy |
| SVG development |
Licensing
I, the copyright holder of this work, hereby publish it under the following licenses:
This file is licensed under the Creative Commons Attribution-Share Alike 3.0 Unported license.
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- share alike – If you remix, transform, or build upon the material, you must distribute your contributions under the same or compatible license as the original.
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Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License. |
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