File:Immersionlithografie - Verbesserung der Tiefenschärfe.svg
Summary
| Description |
Deutsch: Schematische Darstellung zur Verbesserung der Abbildungstiefe, d. h., der Bereich in dem der Fokus für eine scharfe Abbildung ausreichend ist, bei der Immersionslithografie im Vergleich zur konventionellen trockenen Fotolithografie. Dabei wird sichtbar, dass bei der Immersionslithografie die gleiche Abbildungstiefe mit einer geringeren Linsenöffnung (= geringere NA der Linse) zu erreichen ist. Im Umkehrschluss bedeutet dies, dass bei Immersionssystemen mit gleicher NA wie ein trockendes System eine größere Abbildungstiefe erreicht wird.
(Beispielbrechzahlen: Luft = 1,0; Wasser = 1,44; Quarzlinse = 1,56; Fotolack = 1,75, vgl. BJ Lin: SPIE PM - 190 - Optical lithography -- Here is why. SPIE Press, 2010, ISBN 978-0819475602, Seite 327) |
| Date | |
| Source | Own work |
| Author | Cepheiden |
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